Researchers at the Chinese Academy of Sciences’ Shanghai Institute of Optics and Fine Mechanics built a laser-produced plasma EUV light-source platform that hit 3.42% conversion efficiency in a March 2025 paper, a key step toward domestic advanced-chip manufacturing. EUV remains the choke point for sub-7nm production, and ASML has been barred from selling its most…
Researchers at the Chinese Academy of Sciences’ Shanghai Institute of Optics and Fine Mechanics built a laser-produced plasma EUV light-source platform that hit 3.42% conversion efficiency in a March 2025 paper, a key step toward domestic advanced-chip manufacturing. EUV remains the choke point for sub-7nm production, and ASML has been barred from selling its most […]
